Hisatake Sano: search on Z-Library

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1

Effects of the ring-cut excavation method on the restraint of displacements ahead of a tunnel face

M. Hisatake, S. Ohno, T. Katayama, Y. Ohmae, S. Sano

Journal:

Tunnelling and Underground Space Technology

Year:

2009

Language:

english

File:

PDF, 1.00 MB

english, 2009

2

Phonon-Limited Electrical Resistivity of Solid Beryllium

Journal:

Journal of the Physical Society of Japan

Year:

1975

File:

PDF, 1.05 MB

1975

3

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Impact of deformation of the edges of two complementary patterns on electron-beam projection lithography mask making

Sano, Hisatake, Morimoto, Kenichi, Aritsuka, Yuuki, Fujita, Hiroshi, Kawahira, Hiroichi

Year:

2002

Language:

english

File:

PDF, 517 KB

english, 2002

4

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Development of LEEPL 6025 format mask blanks

Aritsuka, Yuuki, Tanabe, Hiroyoshi, Iimura, Yukio, Hoga, Morihisa, Sano, Hisatake

Year:

2003

Language:

english

File:

PDF, 499 KB

english, 2003

5

Analysis of pattern-dependent image placement of single-membrane stencil masks for electron-beam lithography

Hisatake Sano, Naoko Kuwahara, Minoru Kitada, Satoshi Yusa, Horoshi Fujita, Tadahiko Takikawa, Morihisa Hoga

Journal:

Microelectronic Engineering

Year:

2007

Language:

english

File:

PDF, 667 KB

english, 2007

6

Hybrid EB-writing technique with 100 kV-SB and 50 kV-VSB writers: Use of the former for outlines and the latter for bodies after pattern data splitting

Hiroshi Fujita, Mikio Ishikawa, Naoko Kuwahara, Masaharu Fukuda, Masashi Sakaki, Tadahiko Takikawa, Hisatake Sano, Morihisa Hoga, Naoya Hayashi

Journal:

Microelectronic Engineering

Year:

2008

Language:

english

File:

PDF, 1.45 MB

english, 2008

7

Partially diffusion-controlled recombination

Sano, Hisatake, Tachiya, M.

Journal:

The Journal of Chemical Physics

Year:

1979

Language:

english

File:

PDF, 814 KB

english, 1979

8

Theory of diffusion-controlled reactions on spherical surfaces and its application to reactions on micellar surfaces

Journal:

The Journal of Chemical Physics

Year:

1981

Language:

english

File:

PDF, 779 KB

english, 1981

9

Brownian motion of reacting charged particles in ionization tracks

Journal:

The Journal of Chemical Physics

Year:

1982

Language:

english

File:

PDF, 989 KB

english, 1982

10

Scavenging probability of a geminate pair in the presence of an external electric field. Application of the method of matched perturbation solutions

Journal:

The Journal of Chemical Physics

Year:

1983

Language:

english

File:

PDF, 795 KB

english, 1983

11

Energy loss of electrons in random motion. Analytical result

Tachiya, Masanori, Sano, Hisatake

Journal:

The Journal of Chemical Physics

Year:

1977

Language:

english

File:

PDF, 491 KB

english, 1977

12

Solutions to the Smoluchowski equation for problems involving the anisotropic diffusion or absorption of a particle

Journal:

The Journal of Chemical Physics

Year:

1981

Language:

english

File:

PDF, 729 KB

english, 1981

13

SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Development and evaluation of chromium-based attenuated phase-shift masks for DUV exposure

Mikami, Koichi, Mohri, Hiroshi, Miyashita, Hiroyuki, Hayashi, Naoya, Sano, Hisatake, Yoshihara, Hideo

Year:

1995

Language:

english

File:

PDF, 688 KB

english, 1995

14

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Development of a LEEPL mask: flatness and IP measurements

Aritsuka, Yuuki, Tanabe, Hiroyoshi, Kitada, Minoru, Kurosawa, Masaru, Takikawa, Tadahiko, Fujita, Hiroshi, Sano, Hisatake, Hoga, Morihisa, Hayashi, Naoya

Year:

2004

Language:

english

File:

PDF, 209 KB

english, 2004

15

SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Evaluation of CD metrology tools for photomasks for 0.25-μm devices

Fujita, Hiroshi, Sasaki, Shiho, Miyashita, Hiroyuki, Hayashi, Naoya, Sano, Hisatake, Yoshihara, Hideo

Year:

1995

Language:

english

File:

PDF, 463 KB

english, 1995

16

SPIE Proceedings [SPIE 16th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 18 September 1996)] 16th Annual BACUS Symposium on Photomask Technology and Management - Development of the halftone phase-shift mask for DUV exposure

Mikami, Koichi, Mohri, Hiroshi, Itoh, Norihito, Miyashita, Hiroyuki, Hayashi, Naoya, Sano, Hisatake, Shelden, Gilbert V., Reynolds, James A.

Year:

1996

Language:

english

File:

PDF, 777 KB

english, 1996

17

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Experimental analysis of image placement accuracy of single-membrane masks for LEEPL

Kitada, Minoru, Komuro, Masanori, Aritsuka, Yuuki, Yusa, Satoshi, Kuwahara, Naoko, Fujita, Hiroshi, Takikawa, Tadahiko, Sano, Hisatake, Hoga, Morihisa

Year:

2005

Language:

english

File:

PDF, 526 KB

english, 2005

18

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Hybrid EB-writing technique with a 50 kV-VSB writer and a 100 kV-SB writer for nanoimprint mold fabrication

Ishikawa, Mikio, Sakaki, Masashi, Kuwahara, Naoko, Fujita, Hiroshi, Takikawa, Tadahiko, Sano, Hisatake, Hoga, Morihisa, Hayashi, Naoya, Watanabe, Hidehiro

Year:

2007

Language:

english

File:

PDF, 1.45 MB

english, 2007

19

SPIE Proceedings [SPIE Photomask Japan '94 - Kawasaki City, Kanagawa, Japan (Friday 22 April 1994)] Photomask and X-Ray Mask Technology - Manufacturing of half-tone phase-shift masks I: blank

Mohri, Hiroshi, Hashimoto, Keiji, Tominaga, T., Morikawa, Yasutaka, Fujikawa, Junji, Inomata, Hiroyuki, Iimura, Y., Gotoh, Wataru, Takahashi, Masahiro, Sano, Hisatake, Yoshihara, Hideo

Year:

1994

Language:

english

File:

PDF, 437 KB

english, 1994

20

SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Image placement accuracy of single-membrane stencil masks for e-beam lithography

Kitada, Minoru, Weed, J. Tracy, Martin, Patrick M., Yusa, Satoshi, Kuwahara, Naoko, Fujita, Hiroshi, Takikawa, Tadahiko, Sano, Hisatake, Hoga, Morihisa

Year:

2005

Language:

english

File:

PDF, 1.53 MB

english, 2005

21

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - 200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Takikawa, Tadahiko, Mackay, R. Scott, Ishikawa, Mikio, Yusa, Satoshi, Kinase, Yoshinori, Fujita, Hiroshi, Hoga, Morihisa, Hayashi, Naoya, Sano, Hisatake

Year:

2004

Language:

english

File:

PDF, 956 KB

english, 2004

22

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - PMJ 2006 panel discussion review: mask technologies for EUVL

Sugawara, Minoru, Martin, Patrick M., Naber, Robert J., Sano, Hisatake

Year:

2006

Language:

english

File:

PDF, 726 KB

english, 2006

23

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - EBR900 processes in e-beam and laser beam lithographies for photomask fabrication

Kurihara, Masa-aki, Komada, Minoru, Moro-oka, Hisashi, Hayashi, Naoya, Sano, Hisatake, Warlaumont, John M.

Year:

1995

Language:

english

File:

PDF, 887 KB

english, 1995

24

SPIE Proceedings [SPIE Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V - Kawasaki City, Japan (Thursday 9 April 1998)] Photomask and X-Ray Mask Technology V - Performance of a chemically amplified positive resist for next-generation photomask fabrication

Kurihara, Masa-aki, Segawa, Toshikazu, Okuno, Daichi, Hayashi, Naoya, Sano, Hisatake, Aizaki, Naoaki

Year:

1998

Language:

english

File:

PDF, 1.35 MB

english, 1998

25

SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Primary evaluation of proximity and resist heating effects observed in high-acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication

Kuwahara, Naoko, Nakagawa, H., Kurihara, Masa-aki, Hayashi, Naoya, Sano, Hisatake, Maruta, E., Takikawa, T., Noguchi, Shigeru, Morimoto, Hiroaki

Year:

1999

Language:

english

File:

PDF, 720 KB

english, 1999

26

SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Quality assurance of embedded attenuated phase-shift masks

Miyashita, Hiroyuki, Fujita, Hiroshi, Yokoyama, Toshifumi, Hayashi, Naoya, Sano, Hisatake, Shelden, Gilbert V., Wiley, James N.

Year:

1995

Language:

english

File:

PDF, 413 KB

english, 1995

27

SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - Performance of i- and g-line phase-shift measurement system MPM-100

Fujita, Hiroshi, Sano, Hisatake, Kusunose, Haruhiko, Takizawa, Hideo, Miyazaki, Kouji, Awamura, Naoki, Ode, Takahiro, Awamura, Daikichi, Yoshihara, Hideo

Year:

1996

Language:

english

File:

PDF, 670 KB

english, 1996

28

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Evaluation of a transmission CD-SEM for EB stencil masks

Ishikawa, Mikio, Tanabe, Hiroyoshi, Fujita, Hiroshi, Hoga, Morihisa, Sano, Hisatake

Year:

2003

Language:

english

File:

PDF, 451 KB

english, 2003

29

SPIE Proceedings [SPIE 11th Annual BACUS Symposium on Photomask Technology - Sunnyvale, United States (Wednesday 25 September 1991)] 11th Annual BACUS Symposium on Photomask Technology - Evaluation of practical properties of a spin-on-glass for a shifter of phase-shift masks

Miyashita, Hiroyuki, Mikami, Koichi, Sano, Hisatake, McGinnis, Kevin C.

Year:

1992

Language:

english

File:

PDF, 646 KB

english, 1992

30

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

Toyama, Nobuhito, Miyashita, Hiroyuki, Morikawa, Yasutaka, Fujita, Hiroshi, Iwase, Kazuya, Mohri, Hiroshi, Hayashi, Naoya, Sano, Hisatake, Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 301 KB

english, 1999

31

SPIE Proceedings [SPIE 13th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA (Wednesday 22 September 1993)] 13th Annual BACUS Symposium on Photomask Technology and Management - Direct phase measurement in phase-shift masks with a differential heterodyne interferometer

Fujita, Hiroshi, Miyashita, Hiroyuki, Nakamura, Hiroyuki, Sano, Hisatake, Kimura, Kasuhiko, Nakanishi, Hiroshi, Takizawa, Hideo, Yamaguchi, Hidehiko, Ode, Takahiro, Grady, Edward C., Moneta, Jack P.

Year:

1994

Language:

english

File:

PDF, 560 KB

english, 1994

32

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - CD-measurement technique for hole patterns on stencil mask

Ishikawa, Mikio, Staud, Wolfgang, Weed, J. Tracy, Yusa, Satoshi, Takikawa, Tadahiko, Fujita, Hiroshi, Sano, Hisatake, Hoga, Morihisa, Hayashi, Naoya

Year:

2004

Language:

english

File:

PDF, 949 KB

english, 2004

33

SPIE Proceedings [SPIE 17th Annual BACUS Photomask Technology and Management - Redwood City, CA (Wednesday 17 September 1997)] 17th Annual BACUS Symposium on Photomask Technology and Management - Performance of positive-tone chemically amplified resists for next-generation photomask fabrication

Segawa, Toshikazu, Kurihara, Masa-aki, Sasaki, Shiho, Inomata, Hiroyuki, Hayashi, Naoya, Sano, Hisatake, Reynolds, James A., Grenon, Brian J.

Year:

1998

Language:

english

File:

PDF, 390 KB

english, 1998

34

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - PMJ01 panel discussion review: issues on mask technology for 100-nm lithography

Tanabe, Hiroyoshi, Sano, Hisatake, Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 618 KB

english, 2002

35

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - 200-mm EPL stencil mask fabrication and metrology

Fujita, Hiroshi, Kimmel, Kurt R., Staud, Wolfgang, Takigawa, Tadahiko, Ishikawa, Mikio, Aritsuka, Yu-ki, Yusa, Satoshi, Hoga, Morihisa, Sano, Hisatake

Year:

2003

Language:

english

File:

PDF, 1.18 MB

english, 2003

36

SPIE Proceedings [SPIE Photomask Technology - Sunnyville, CA (Wednesday 23 September 1992)] 12th Annual BACUS Symposium on Photomask Technology and Management - Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II

Kurihara, Masa-aki, Arai, Masumi, Fujita, Hiroshi, Moro-oka, Hisashi, Takahashi, Yoichi, Sano, Hisatake, Landstrom, Scott, LaFrance, Richard

Year:

1993

Language:

english

File:

PDF, 557 KB

english, 1993

37

SPIE Proceedings [SPIE 14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA (Wednesday 14 September 1994)] 14th Annual BACUS Symposium on Photomask Technology and Management - Chromium-based attenuated phase shifter for DUV exposure

Mohri, Hiroshi, Takahashi, Masahiro, Mikami, Koichi, Miyashita, Hiroyuki, Hayashi, Naoya, Sano, Hisatake, Brodsky, William L., Shelden, Gilbert V.

Year:

1994

Language:

english

File:

PDF, 662 KB

english, 1994

38

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Development of photomask process with precise CD control, and an approach for DFM (defect-free manufacturing) using a cluster tool

Sasaki, Shiho, Yokoyama, Toshifumi, Kurihara, Masa-aki, Miyashita, Hiroyuki, Hayashi, Naoya, Sano, Hisatake, Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 1020 KB

english, 2000

39

SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks

Matsumoto, Masami, Aizaki, Naoaki, Abe, Tsukasa, Yokoyama, Toshifumi, Miyashita, Hiroyuki, Hayashi, Naoya, Sano, Hisatake

Year:

1997

Language:

english

File:

PDF, 799 KB

english, 1997

40

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Evaluation of image placement of EPL stencil masks

Yusa, Satoshi, Tanabe, Hiroyoshi, Ishikawa, Mikio, Kinase, Yoshinori, Takikawa, Tadahiko, Fujita, Hiroshi, Sano, Hisatake, Houga, Morihisa, Hayashi, Naoya

Year:

2004

Language:

english

File:

PDF, 312 KB

english, 2004

41

Normal and Abnormal Absorption Coefficients of X-Rays

Sano, Hisatake, Ohtaka, Kazuo, Ohtsuki, Yoshi-Hiko

Journal:

Journal of the Physical Society of Japan

Year:

1969

File:

PDF, 784 KB

1969

42

Simple and effective generation of transgene-free induced pluripotent stem cells using an auto-erasable Sendai virus vector responding to microRNA-302

Nishimura, Ken, Ohtaka, Manami, Takada, Hitomi, Kurisaki, Akira, Tran, Nhi Vo Kieu, Tran, Yen Thi Hai, Hisatake, Koji, Sano, Masayuki, Nakanishi, Mahito

Journal:

Stem Cell Research

Year:

2017

Language:

english

File:

PDF, 1.66 MB

english, 2017

43

Microfabrication and Plating. Photolithography. Etching.

Journal:

Journal of The Surface Finishing Society of Japan

Year:

1995

File:

PDF, 1.23 MB

1995

44

Bisoprolol transdermal patch improves orthostatic hypotension in patients with chronic heart failure and hypertension

Kiuchi, Shunsuke, Hisatake, Shinji, Kabuki, Takayuki, Oka, Takashi, Dobashi, Shintaro, Fujii, Takahiro, Sano, Takahide, Ikeda, Takanori

Journal:

Clinical and Experimental Hypertension

Year:

2020

File:

PDF, 777 KB

2020

45

Cardio-ankle vascular index predicts the 1-year prognosis of heart failure patients categorized in clinical scenario 1

Sano, Takahide, Kiuchi, Shunsuke, Hisatake, Shinji, Kabuki, Takayuki, Oka, Takashi, Fujii, Takahiro, Dobashi, Shintaro, Ikeda, Takanori

Journal:

Heart and Vessels

Year:

2020

File:

PDF, 694 KB

2020

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